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Introducing The CA-150 High-Throughput Large Batch Thin Film Deposition System

  • More than 2 times the capacity of the CA-50/Mark-50 systems
  • 30 minute pump down combined with large capacity equals more productivity
  • Worldwide Service and Support
  • Adjustable source to substrate distance up to 55 inches

Using planetary fixturing in the system each deposition cycle can process up to:
243x 3-inch wafers
123x 4-inch wafers
84x 5-inch wafers
54x 6-inch wafers
30x 8-inch wafers